4fFrank @4fFrank

ray tracing should be taught in schools. give every adolescent snell’s law, the refractive index of water and an afternoon to figure out why the second rainbow is backwards. this would fix several things

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4fFrank @4fFrank

2 months ago

#optics

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4fFrank @4fFrank

2 months ago

Everyone should have their own little raytracing engine

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i²cjak @i2cjak

2 months ago

TSMC: "we're hitting tin droplets with EUV lasers 60,000 times per second to etch features that are but a few 10s of nanometers wide" memory guys: "im makign a sammwich"

outside five sigma @jwt0625

2 months ago

SK hynix generating more revenue than tsmc is blowing my freaking mind, kudos to them, but memory is so much simpler than logic, like the BEOL metal layer is 3x fewer for DRAM than for logic, this is not gonna end well

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4fFrank @4fFrank

2 months ago

@Yuchenj_UW Skill issue

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4fFrank @4fFrank

2 months ago

@fishPointer and it’s of utmost importance that one understands how the glass is made at every stage

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4fFrank @4fFrank

2 months ago

@i2cjak If you open source it yeah (👀👀??)

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ADHD Memes @ADHDForReal

2 months ago

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َ @Lilypond

2 months ago

August kinda feel like there’s a giant imaginary clock ticking on top of your head

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4fFrank @4fFrank

2 months ago

What a weird looking frog

CTO ROBOTICS Media @ctorobotics

2 months ago

This isn't science fiction anymore. 🧲 The Chinese University of Hong Kong researchers developed a magnetic slime robot that can be remotely controlled to move, squeeze through tight spaces, and even grasp objects. One potential application? Removing objects accidentally

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4fFrank @4fFrank

2 months ago

@Umesh__digital Optical engineer here, this is just impossible!

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4fFrank @4fFrank

2 months ago

gouy had no right

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4fFrank @4fFrank

2 months ago

why do we care so much about this Leopold dude again?

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Object Zero @Object_Zero_

2 months ago

High NA-EUV Lithography Zeiss is beginning production of their High NA-EUV systems for ASML. “High NA” means high numerical aperture, which is a measure of the angular range from which an optical system can pick up light. For context High NA has numerical aperture of 0.55, whereas current EUV NA is 0.33 A 66% improvement. That’s a feature density improvement of 1.67^2=2.789 so a near tripling of transistor density per unit area. It brings the critical dimension down to 8nm from 13nm. Q: How did Zeiss achieve this? A: With great difficulty. • The projection optics system is 40,000 parts and around 12 tonnes. • The illumination system is 25,000 parts and is 6 tonnes. • The machine that manufacturers these mirrors is based in Germany, and consists of 100,000 parts and is 150 tonnes, the machining chamber itself is a 5m x 5m x 10m vacuum chamber. The mirrors are machined for 3 months[!] to achieve a precision equivalent to 1mm deviation over an area the size of the Pacific Ocean. It’s worth noting here that theoretical maximum NA = 1.0 Hyper NA (>0.7 and achieved using 8 mirrors) is expected the enter production 2032 - 2035. That brings the critical dimension down to around 6nm and that might be the end, a single silicon atom is 0.23nm so the precision would be +/- 24 atoms. Fun note… there is a category of lathes and machine tools called “ultra-precision” and these have axis resolutions of 1-2nm and can produce contoured shapes to 25nm accuracy. You can buy “ultra-precision” machines, grinding machines for optical equipment have incredibly precise axis control because surface asperity on a mirror is visible to the eye. B23B is the IPC/CPC class, and it teaches some interesting niche stuff (tells you where the future is going, even with trade secrets omitted).